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Series in
Microelectronics
edited by Wolfgang Fichtner
Qiuting Huang
Heinz Jäckel
Hans Melchior
George S. Moschytz
Gerhard Tröster
Vol. 147
Frank Geelhaar,
Coulomb Correlation Effects
in Silicon Devices.
2004. 188 pages. € 64,00.
ISBN 3-89649-941-6
Topic of this doctoral thesis are the correlation effects between the
charge carriers in silicon devices which originate from the long-range Coulomb
interaction. In the first part, the formation of bound states and the
plasma-induced band gap narrowing are investigated in the framework of a
many-body Green's function technique. The second part treats the ohmic
transport in bipolar systems on the basis of the coupled linearised Boltzmann
equations for the electrons and holes. The Chapman-Enskog method is employed to
compute the minority and majority carrier mobilities, both in the Born and
T-matrix approximations. Particular emphasis is laid on the influence of
carrier-carrier scattering processes, and comparisons with experiment are
performed.
Frank Geelhaar was born in Baden-Baden, Germany, on 21 August 1969.
He studied physics at the University of Hamburg, Germany, where he received his
Dipl.-Phys. (M.Sc.) degree in 1996. In the same year, he joined the School of
Computer Science & Engineering and the Photovoltaics Special Research
Centre at the University of New South Wales in Sydney, Australia, as a research
assistant. From 1998 to 2004 he was a member of scientific staff in the
Technology CAD Group of the Integrated Systems Laboratory at the Swiss Federal
Institute of Technology Zurich, Switzerland. His research interests focus on
numerical device simulation, semiconductor transport theory, and many-particle
effects. Frank Geelhaar is a fellow of the Gottlieb Daimler- and Karl
Benz-Foundation, Ladenburg, Germany.
Keywords (German):
TCAD, Halbleiterbauelementsimulation, Mobilitätsmodellierung,
Coulomb-Wechselwirkung, Excitonen
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