Inh.: Dr. Renate Gorre
Fon: +49 (0)7533 97227
Fax: +49 (0)7533 97228
Series in Microelectronics
Mesh Generation Algorithms
Semiconductor Process Simulation.
2000. VIII, 104 pages. € 49,80
This dissertation describes a set of algorithms that can be used to generate finite element meshes for three-dimensional semiconductor process simulation.
The first contribution is the description of a new type of mesh which is suitable for the Box Method. This description is combined with an algorithm that can be used to convert any mesh into a Box Method conforming mesh.
Additionally, a new algorithm is described, which is able to handle the changes of the material boundaries during process steps like deposition and etching. Finally, a technique is described which can be used to improve the numerical stability of the algorithms computing geometric expressions.
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Hartung-Gorre Verlag / D-78465 Konstanz / Germany