edited by  P. A. Besse,
J. Brugger,
M. Gijs,
R. S. Popovic,
Ph. Renaud

Vol. 20:

Marc Antonius Friedrich van den Boogaart


Stencil lithography:

An ancient technique for advanced
micro- and nanopatterning


2006, VIII, 182 p.; € 64,00. ISBN 3-86628-110-2


An increased demand for micro- and nanometer scale patterning on “unconventional” surfaces and/or non-IC applications has given rise to new and alternative patterning technologies. These new methods include: indentation of polymers by nanoimprint lithography (NIL), local deposition of molecules via a stamp by micro contact printing (µCP) or soft-lithography, or via dip-pen nanolithography (DPN), nanoscale fluidic dispensing (NADIS) and localized material deposition through ultra-miniature shadow masks (nanostencils).

This book describes the advancements made in micro and nano patterning via stencil lithography. Stencil lithography is a resist-less and direct pattern technique where a controlled amount of material is deposited through apertures on to a substrate in a vacuum environment. This unique approach enables large scale micro and nano structuring of unconventional materials and on a large range of substrates otherwise not possible using conventional photolithography.


Marc Antonius Friedrich van den Boogaart was born in Rotterdam, The Netherlands, in 1977. He received his Diploma in Precision Engineering (Fijn Mechanische Techniek) from the Hogeschool van Utrecht, Utrecht, The Netherlands in 2000 after carrying out his diploma project at Utrecht Micro Engineering Competence Centre (UMECC), The Netherlands. He then joined the department of Signals and Systems at the University of Twente, Enschede, The Netherlands as a Micro Engineer where he designed, developed and produced multi-electrode array's (MEA's) for use as neuroelectronic interfaces. The MESA+ institute facilitated as production facility. In 2002 he joined the Institute of Microelectronics and Microsystems at the Ecole Polytechnique Fédérale de Lausanne (EPFL), Switzerland, as a research and teaching assistant. In 2006 he obtained his Ph.D. for his work on the development Stencil Lithography, a large-scale and resist-less micro and nano patterning technique.


Keywords: Shadow mask, stencil, stencil lithography, planar stencil membranes, stabilized stencil membranes, physical vapor deposition, micro and nano patterning, finite element method, FEM, dynamic stencil lithography.


Hartung-Gorre Verlag Konstanz

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